I-fuse* is a disruptive fuse-based OTP technology based on true electromigration with excellent manufacturability. Conventional ways of programming a fuse is by applying a large current to break the fuse such that the program behavior is like an explosion. The debris created during the explosion may micro-bridge again and grow back to cause several reliability issues. By limiting the programming current below a catastrophic breaking point, the reliability of the I-fuse can be 100×. By using junction diode, instead of MOS, as program selector, the cell size can be only 1/100. By making fuse cells small to preserve heat better, the program current can be only 1/10 of the conventional electrical fuse (eFuse).
/wp-content/uploads/2022/07/Attopsemi-logo_500x200.png 0 0 martin_hsieh /wp-content/uploads/2022/07/Attopsemi-logo_500x200.png martin_hsieh2015-11-16 14:45:402023-05-17 16:53:27I-fuse: A disruptive OTP technology for with excellent manufacturability