I-fuse: A disruptive OTP technology for with excellent manufacturability

I-fuse* is a disruptive fuse-based OTP technology based on true electromigration with excellent manufacturability. Conventional ways of programming a fuse is by applying a large current to break the fuse such that the program behavior is like an explosion. The debris created during the explosion may micro-bridge again and grow back to cause several reliability issues. By limiting the programming current below a catastrophic breaking point, the reliability of the I-fuse can be 100×. By using junction diode, instead of MOS, as program selector, the cell size can be only 1/100. By making fuse cells small to preserve heat better, the program current can be only 1/10 of the conventional electrical fuse (eFuse).

Published in: 2015 Joint e-Manufacturing and Design Collaboration Symposium (eMDC) & 2015 International Symposium on Semiconductor Manufacturing (ISSM)